Semiconductor device manufacturing method and semiconductor manufacturing apparatus

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United States of America Patent

SERIAL NO

11330548

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Abstract

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A semiconductor device manufacturing method comprises a first step of forming, by a thermal chemical vapor deposition method, a silicon nitride film on an object disposed in a reaction container, with bis tertiary butyl amino silane and NH.sub.3 flowing into the reaction container, and a second step of removing silicon nitride formed in the reaction container, with NF.sub.3 gas flowing into the reaction container.

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Patent Owner(s)

Patent OwnerAddress
KOKUSAI ELECTRIC CO LTDA CORPORATION OF JAPAN 3-13 2-CHOME TORANOMON MINATO-KU TOKYO-TO JAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Maeda, Kiyohiko Tokyo, JP 41 1594
Mizuno, Norikazu Tokyo, JP 51 1944

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