Method for exposing a substrate with a beam
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United States of America Patent
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N/A
Issued Date -
Jun 8, 2006
app pub date -
Nov 29, 2005
filing date -
Dec 8, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method is disclosed in which the speed of the substrate carrier system 50 is changed during exposure depending on the exposure pattern density. The substrate carrier system 50 defines a track curve 60, whereby the exposure pattern is exposed within a band (62.sub.1, 62.sub.2, . . . 62.sub.3) around the track curve.
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