Method and apparatus for manufacturing a catalyst
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United States of America Patent
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Issued Date -
May 11, 2006
app pub date -
Jun 23, 2003
filing date -
Jun 21, 2002
priority date (Note) -
Abandoned
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Abstract
A method for manufacturing a catalyst, wherein a substrate (I) is introduced into a processing chamber (2, 102); wherein at least one plasma (P) is generated by at least one plasma cascade source (3, 103); wherein at least one deposition material (A, B) is deposited on the substrate (1, 101) under the influence of the plasma (P). The invention further provides an apparatus for manufacturing a catalyst, the apparatus being provided with at least one plasma cascade source (3, 103) for generating at least one plasma (P), the apparatus comprising means for bringing deposition material (A, B) into each plasma (P), the apparatus being further provided with substrate positioning means (8, 118) to bring and/or keep at least a part of a substrate (1, 101) in such a position in a processing chamber (2, 102) that the substrate (1, 101) makes contact with the plasma (P).
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