Method of depositing a material providing a specified attenuation and phase shift
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United States of America Patent
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Issued Date -
May 11, 2006
app pub date -
Nov 10, 2004
filing date -
Nov 10, 2004
priority date (Note) -
Abandoned
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Abstract
The invention allows for the control of the attenuation and the phase of light transmitted through a deposited material. The invention is particularly applicable to the repair of attenuated phase shift photomasks. The transmission and the phase of the repaired area can be controlled. In a preferred embodiment, the phase of light transmitted through the repaired area is controlled by controlling the thickness of a deposited material, and the transmissivity of the repaired area is controlled by controlling the introduction of a contaminant into the repair area.
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