Apparatus for treating thin film and method of treating thin film
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United States of America Patent
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Issued Date -
Mar 30, 2006
app pub date -
Aug 24, 2005
filing date -
Aug 27, 2004
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Abandoned
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Abstract
An apparatus for treating a thin film on a substrate includes a stage on which the substrate is disposed. A gas shield faces the substrate. An energy source irradiates a part of the substrate with light emitted therefrom through a retention space of the gas shield. A dispense unit includes a pin nozzle that injects a reaction gas towards the part of the substrate.
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