Micromachined structures made by combined wet and dry etching
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United States of America Patent
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app pub date -
Nov 16, 2005
filing date -
Feb 14, 2001
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Abandoned
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Abstract
A micromachined structure, comprising: a substrate; a first wet etched pit disposed in the substrate; a second wet etched pit disposed in the substrate, the second pit extending into the substrate a greater depth than the first pit; and a dry pit disposed between, and adjacent to, the first and second pits. Also disclosed is a micromachined substrate comprising: a wet etched pit; and a dry-etched hole disposed in the wet etched pit, wherein the dry hole extends through the substrate.
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