System and method for optimizing data acquisition of plasma using a feedback control module
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United States of America Patent
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Issued Date -
Mar 9, 2006
app pub date -
Sep 8, 2004
filing date -
Sep 8, 2004
priority date (Note) -
Abandoned
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Abstract
Method, systems and computer readable media for optimizing data acquisition of microwave plasma are disclosed. The present invention provides a method that includes the steps of selecting an operational condition for a plasma generation system, operating the plasma generation system under the selected operational condition, determining whether a stable plasma is established using a sensing device and acquiring/storing plasma data if the stable plasma is established. The method further includes a step of repeating data acquisition under various operational conditions to establish a database for plasma characterization. The present invention further provides a feedback control module that operates in conjunction with a plasma generating system to automate and optimize the process of data acquisition.
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