Silyl alkyl esters of anthracene-and phenanthrene carboxylic acids
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United States of America Patent
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Jun 20, 2003
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Jun 21, 2002
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Abstract
The invention relates to silyl alkyl esters, in particular of anthracene and phenanthrene carboxylic acids, a process for their preparation, compositions and polysiloxane compositions which contain the silyl alkyl esters and which can be used in particular in the semiconductor industry for the preparation of anti-reflective layers for photolithographic applications.
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