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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
OBDUCAT AB	223 63 LUND

International Classification(s)

• B05D:PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MAT....

• 2004 Application Filing Year
• B05D Class
• 1428 Applications Filed
• 464 Patents Issued To-Date
• 32.50 % Issued To-Date

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Beck, Marc	Lund, SE	13	274
# of filed Patents : 13 Total Citations : 274
Heidari, Babak	Furulund, SE	29	627
# of filed Patents : 29 Total Citations : 627

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Patent Citation Ranking

• 4 Citation Count
• B05D Class

• 4.40 % this patent is cited more than
• 19 Age

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2006/0040,058

Multilayer nano imprint lithography

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Abstract

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An improved method for nanoimprint lithography and more specifically for providing a nano-scale pattern on a substrate is disclosed. According to the improvement, a mould (100) and a substrate (115) are provided wherein the substrate (115) is provided with a plurality of coating layers (120, 125, 130) before pressing the mould (100) and substrate (115) together for transferring a pattern from the mould (100) to the substrate (115). According to the invention, the substrate is provided with an uppermost layer (130) having a pure anti-adhesive function.

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Description

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Claims

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