Method of manufacturing polishing slurry for use in precise polishing process
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United States of America Patent
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Issued Date -
Feb 16, 2006
app pub date -
Jul 29, 2005
filing date -
Jul 30, 2004
priority date (Note) -
Abandoned
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Abstract
An abrasive and a dispersion medium are introduced into a dispersing machine to uniformly disperse the abrasive. The liquid to be processed after dispersion is centrifugally classified by a centrifugal classifier to remove heavy particles which will cause scratches. Chemicals are added to the liquid to be processed after classification to make adjustments on a variety of properties such as the concentration, pH, and the like. The polishing slurry after adjustment for a desired composition is filtered by a filter to remove debris therefrom. The filter may have a mesh size large enough to allow particles of the abrasive to pass therethrough.
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