Compensating venturi vacuum system
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United States of America Patent
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Issued Date -
Feb 9, 2006
app pub date -
Aug 3, 2004
filing date -
Aug 3, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A venturi-based vacuum system that provides a compensated vacuum supply to a vacuum utilization device. The system creates a vacuum by means of a source gas passing through a standard venturi with a flow control valve controlling the flow of that source gas and thus, the level of vacuum produced. A feedback system is provided that makes the vacuum system self-compensating. The feedback system senses the level of vacuum in a vacuum supply outlet to the vacuum utilization device and uses that sensed level to control the setting of the flow control valve. As such, changes in flow in the vacuum utilization device that result in changes in the vacuum level from the vacuum system are compensated for by a corresponding change in the setting of the flow control valve to maintain the vacuum level at a constant level.
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