Nanoprinting method
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United States of America Patent
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-
Jan 22, 2008
Grant Date -
Feb 9, 2006
app pub date -
Sep 15, 2003
filing date -
Sep 16, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Patterns of nanometer and micrometer dimensions are printed on a substrate by first forming a solution or suspension of a liquid and a printing material and then applying a layer of the solution or suspension to the substrate. Then, without applying pressure, a stamp provided with relief patterns is positioned at a distance of 0 nm to 500 .mu.m from the substrate with the relief patterns in contact with the layer of the solution or suspension. The liquid is then evaporated from the solution or suspension from between the substrate and the stamp so as to draw the suspension or solution by capillarity to the relief patterns and deposit the material on the substrate in accordance with the relief patterns of the stamp. Thereafter the stamp is separated from the substrate.
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