Photosensitive compositions based on polycyclic polymers for low stress, high temperature films
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United States of America Patent
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Issued Date -
Jan 26, 2006
app pub date -
Apr 14, 2005
filing date -
Jul 7, 2004
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Abandoned
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Abstract
Vinyl addition polymer compositions, methods for forming such compositions, methods for using such compositions to form microelectronic and optoelectronic devices are provided. The vinyl addition polymer encompassed by such compositions has a polymer backbone having two or more distinct types of repeat units derived from norbornene-type monomers independently selected from monomers of Formula I: wherein each of X, m, R.sup.1, R.sup.2, R.sup.3, and R.sup.4 is as defined herein and wherein a first type of repeat unit is derived from a glycidyl ether substituted norbornene monomer and a second type of repeat unit is derived from an aralkyl substituted norbornene monomer.
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