Plasma enhanced chemical vapor deposition system for forming carbon nanotubes
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United States of America Patent
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Issued Date -
Jan 12, 2006
app pub date -
Jul 12, 2004
filing date -
Jul 12, 2004
priority date (Note) -
Abandoned
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Abstract
An embodiment of a system for forming carbon nanotubes (CNTs) using plasma enhanced chemical vapor deposition (PECVD) uses one or more of RF and DC power supplies coupled to electrodes in various configurations within a process chamber of the system. By application of a sufficient DC voltage to one or more electrodes, the system allows for growing CNTs that can be straighter and have improved electrical performance characteristics.
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