Coating apparatus with substrate cleaner
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United States of America Patent
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Issued Date -
Oct 27, 2005
app pub date -
Apr 20, 2005
filing date -
Apr 23, 2004
priority date (Note) -
Abandoned
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Abstract
A coating apparatus (20) for forming a photoresist film on a substrate (21) includes a flat table (30), a nozzle unit (40), and a particle cleaning unit (50). The flat table is used for supporting the substrate. The nozzle unit is used for dispensing photoresist material on a top surface of the substrate. The particle cleaning unit is used for removing particles from the top surface before the photoresist material is coated thereon. The coating apparatus can timely clean the substrate before coating. The coating performance is improved, and the nozzle unit is protected from being scratched or damaged.
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