Etchants for removing titanium contaminant species from titanium substrates
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United States of America Patent
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app pub date -
Feb 9, 2005
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Apr 5, 2004
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Abstract
Described are methods for removing titanium species, including titanium metal and titanium nitride, from titanium substrates. Hydrofluoric acid chemistries are traditionally disfavored for such tasks, as hydrofluoric acid tends to attack the underlying titanium substrate. A chemistry in accordance with one embodiment employs a mixture of hydrofluoric acid and hydrogen peroxide that vigorously attacks deposited titanium and titanium nitride without significantly attacking the machined titanium alloys normally used to form titanium components for semiconductor processing.
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