Plasma cvd film forming apparatus and method for manufacturing cvd film coated plastic container
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United States of America Patent
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Issued Date -
Oct 20, 2005
app pub date -
Oct 5, 2004
filing date -
Apr 11, 2002
priority date (Note) -
Abandoned
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Abstract
The restriction that the outer electrode of a conventional CVD film forming apparatus has to have a hollow structure including a hollow which is for accommodating a container and has a shape generally similar to the outer shape of the container is eliminated. A plasma CVD film forming apparatus is characterized in that a container outside gas is supplied into the space defined between the inner wall of an outer electrode and the outer surface of a container spaced from the inner wall, the plasma thereby produced from the container outside gas in forming a film by CVD serves as a conductor and transmits high-frequency to the outer wall of the container, a state is brought about in which the inner wall of the outer electrode is equivalently in contact with the outer surface of the plastic container, and a uniform self-bias voltage is applied to the inner wall of the container.
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