Reduced-reflection film having low-refractive-index layer
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United States of America Patent
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app pub date -
Nov 29, 2004
filing date -
Jul 5, 2002
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Abandoned
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Abstract
A anti-reflection film with pen scratch resistance has a low refractive index layer formed from a raw material composition containing silicon oxide and a crosslinking agent as main components. The raw material composition contains 1 to 10 wt % of a polymerization initiator and 1 to 5 wt % of a polysiloxane resin with respect to the sum of silicon oxide and the crosslinking agent.
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