Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors
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United States of America Patent
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Issued Date -
Oct 13, 2005
app pub date -
Apr 8, 2004
filing date -
Apr 8, 2004
priority date (Note) -
Abandoned
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Abstract
A chemical vapor deposition (CVD) apparatus usable in the manufacture of a superconducting conductor on an elongate substrate is disclosed. The CVD apparatus includes a reactor, at least one substrate heater, and at least one precursor injector having a longitudinal flow distributor. Optionally, the CVD apparatus may include one of a transverse lateral flow restrictor, a shield for protecting a low-temperature region of the substrate, and both.
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