Process for producing semi-conductor coated substrate
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United States of America Patent
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Issued Date -
Sep 29, 2005
app pub date -
Mar 24, 2004
filing date -
Mar 24, 2004
priority date (Note) -
Abandoned
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Abstract
A process of producing a clean substrate for use in semi-conductor processing in which the substrate is roughened to produce microfissures therein and then treated with a high concentration of a strong acid followed by coating with a material containing at least one metal oxide.
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