Method and apparatus for applying materials to an optical substrate
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United States of America Patent
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Issued Date -
Sep 29, 2005
app pub date -
Jan 21, 2005
filing date -
Jan 22, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The apparatus and method described utilizes a discrete deposition process to apply materials to an optical substrate. The materials can be applied to an optical substrate to create an ophthalmic lens or apply a coating to a lens or other optical surface. Average surface roughness below 10 nanometers can be achieved using the described apparatus and method. Localized error is minimized to less than 1 micron over a 1 mm linear distance to avoid a lens anomaly such as a localized power distortion or power wave. Coating is applied to an entire substrate surface or selected portions. Material can be deposited on the optical substrate to provide the substrate with desired refracting properties. One or more surfaces of the substrate can be coated. Waste material is minimized and a uniform coating is applied for the improvement of optical qualities of the substrate.
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