Photomask and method for creating a protective layer on the same
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United States of America Patent
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Issued Date -
Sep 22, 2005
app pub date -
May 20, 2005
filing date -
Nov 25, 2002
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A photomask and method for creating a protective layer on the photomask are disclosed. The method includes placing a photomask including a patterned layer formed on at least a portion of a substrate in a chamber. Oxygen is introduced into the chamber proximate the patterned layer and the photomask is exposed to radiant energy that initiates a reaction between the oxygen and the patterned layer in order to passivate the patterned layer and prevent optical properties of the patterned layer from being altered by a cleaning process.
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