Precursor compounds for deposition of ceramic and metal films and preparation methods thereof
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United States of America Patent
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Issued Date -
Sep 15, 2005
app pub date -
Mar 11, 2005
filing date -
Mar 12, 2004
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Abstract
The present invention relates to precursor compounds for the deposition of ceramic and metal films. It provides precursor compounds used for depositing on a silicon substrate ceramic and metal films, such as metal nitride, metal oxide, metal silicide, mixed metal nitrides, oxides, and silicides, and pure metals, preparation methods thereof, and methods for using said compounds to form films on said substrates.
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