Plasma processing apparatus and method of plasma processing
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United States of America Patent
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Issued Date -
Sep 1, 2005
app pub date -
Feb 15, 2005
filing date -
Feb 27, 2004
priority date (Note) -
Abandoned
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Abstract
Plasma processing apparatus and plasma processing methods capable of maintaining acceptable etching characteristics and to prevent degradation of a lower electrode even when the focus ring is severely eroded by the plasma, while leaving the plasma discharge conditions used in the conventional apparatus and methods substantially unchanged, are disclosed. According to an exemplary embodiment, a side-surface protecting ring formed of a ceramic material is provided to cover the side surface of the lower electrode such that an outer perimeter of the side-surface protecting ring is approximately aligned with, or inside, an outer perimeter of the substrate to be processed. As a result, the side-surface protecting ring does not influence the plasma characteristic.
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