Reducing stress in coatings produced by physical vapour deposition

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United States of America Patent

APP PUB NO 20050183944A1
SERIAL NO

11036986

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Abstract

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Coatings are deposited using arc-based deposition methods using a large negative bias on the substrate, of -1,500 V or more negative, which is varied during deposition, resulting in reduced stress in the coating.

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Patent Owner(s)

Patent OwnerAddress
NANOFILM TECHNOLOGIES INTERNATIONAL PTE LTDBLOCK 28 #02-02/03/04 AYER RAJAH CRESCENT AYER RAJAH INDUSTRIAL ESTATE SINGAPORE 139959

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cheah, Li Kang Singapore, SG 10 60
Shi, Xu Singapore, SG 48 218

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