Release film
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United States of America Patent
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Issued Date -
Aug 18, 2005
app pub date -
Mar 24, 2005
filing date -
Jan 30, 2002
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A release film having a release layer on at least one surface of a base film, the proportion of silicon atoms to carbon atoms (Si/C) in the surface of said release layer being not more than 0.01, the proportion of halogen atoms to carbon atoms (X/C) being not more than 0.1, the peel force of said release film being not more than 75 mN/cm, and the retained adhesion rate of said release film being not less than 80%. This release film contains substantially no silicon and halogen elements and is of the easy release type.
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