Reflecting electrode forming method and liquid crystal display
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United States of America Patent
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Issued Date -
Aug 18, 2005
app pub date -
Mar 26, 2004
filing date -
Sep 28, 2001
priority date (Note) -
Abandoned
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Abstract
The invention provides a method of forming a reflective electrode with a reduced number of manufacturing steps and a reduced cost, and provides a liquid crystal display device to which said method is applied. A resist coating is applied on a reflective electrode film (3). Then the resist coating is exposed to light and developed in such a way that the remaining portions (4) of the resist coating having a plurality of holes (4a) remain. Then the reflective electrode film (3) is dry-etched using the remaining portions (4) as etching masks. Such a dry etching of the reflective electrode film (3) using the remaining portions (4) as etching masks forms a reflective electrode (30) having a plurality of holes (30a) in each pixel. Further, since the thickness changing region (30b) in which a thickness changes continuously is provided in the periphery of each hole (30a), the reflective electrode (30) can have a desired reflective characteristics.
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