Method and device for correcting pattern film on a semiconductor substrate
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United States of America Patent
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app pub date -
Apr 5, 2005
filing date -
Oct 19, 2000
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Abandoned
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Abstract
In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film.
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