Importance

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Abstract

Carbon nanotubes are formed on a surface of a substrate using a plasma chemical deposition process. The nanotubes are grown by plasma enhanced chemical vapor deposition using a source gas and a plasma and are then purified by plasma etching using a purification gas. These growth and purification steps are repeated without evacuating the chamber and without turning off the plasma. After the nanotubes are grown, a post-treatment step is performed on the nanotubes by etching using the plasma. During the transition from the nanotube growth step to the post treatment step, the pressure in the plasma process chamber is stabilized without turning off the plasma. The entire process or a portion thereof may be iterated to achieve a carbon nanotube layer having highly uniform physical characteristics. Additionally, the etching in the post-treatment step may be reduced each iteration.

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First Claim