Method for dry cleaning with binary vapor
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United States of America Patent
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Issued Date -
Jun 23, 2005
app pub date -
Dec 18, 2003
filing date -
Dec 18, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
This invention is a method for dry cleaning with binary vapor in which articles such as fabrics and the like are subjected to tumbling in a basket or chamber while heated air is circulated through said chamber. While being tumbled, the articles are exposed to a binary vapor consisting of water and solvent under pressure which loosens or removes debris and soils from the articles. The debris and soils are carried by the air and binary vapor to a filter where the soils and debris are captured with the binary vapor continuing on to a condenser where the binary vapor is converted to binary liquid. Upon conclusion of the cycle the articles are removed from the chamber.
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