Photocatalytic fabric product and a manufacturing method thereof
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United States of America Patent
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Issued Date -
Jun 16, 2005
app pub date -
May 5, 2004
filing date -
Nov 11, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A photocatalytic fabric products and a manufacturing method thereof uses a plasma polymerization process and a sputtering process under the vacuum environment. The protective layer is deposited on the surface of the fabric product. Then, it uses the sputtering process to excite the photocatalytic material. The atom of the photocatalytic material is excited and forms the photocatalytic thin-film on the surface of the fabric substrate. The thin-film has hydrophilic and anti-bacterial properties thereto can enhance the hydrophilic and anti-bacterial functions in the fabric product. Further, it can widely apply to the medical, upholstery, and other fiber-related field.
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