Method for cleaning substrate and apparatus therefor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
Jan 18, 2005
filing date -
Sep 20, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Importance

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Abstract
A substrate cleaning method and an apparatus therefor capable of increasing a particle removal ratio at which particles firmly adhering to a substrate are removed therefrom and increasing a throughput. A substrate such as a wafer or the like placed in a cleaning tank filled therein with a cleaning liquid is cleaned by an ultrasonic vibration. Cleaning of the substrate is carried out in such a manner that an ultrasonic vibration is applied to the substrate from a bottom of the cleaning tank, during which application the substrate is kept at a predetermined inclination angle with respect to a direction of acoustic streaming in the cleaning liquid formed by propagation of an ultrasonic wave.
First Claim
all claims..Other Claims data not available
Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
JP | A | JP2002093765 | Sep 20, 2000 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
Published unexamined patent application | METHOD AND EQUIPMENT FOR CLEANING SUBSTRATE | Mar 29, 2002 | |||
US | A1 | US20020139390 | Sep 20, 2001 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
FIRST PUBLISHED PATENT APPLICATION | Method for cleaning substrate and apparatus therefor | Oct 03, 2002 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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KAIJO CORPORATION | HAMURA-SHI TOKYO 205-8607 |
International Classification(s)

- 2005 Application Filing Year
- B08B Class
- 559 Applications Filed
- 304 Patents Issued To-Date
- 54.39 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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Okano, Shoichi | Tokyo, JP | 4 | 85 |
# of filed Patents : 4 Total Citations : 85 | |||
Takahashi, Norihisa | Tokyo, JP | 12 | 105 |
# of filed Patents : 12 Total Citations : 105 |
Cited Art Landscape
- No Cited Art to Display

Patent Citation Ranking
- 4 Citation Count
- B08B Class
- 3.13 % this patent is cited more than
- 20 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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