Method for producing chlorosilanes
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United States of America Patent
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Issued Date -
Apr 7, 2005
app pub date -
Jul 22, 2003
filing date -
Sep 11, 2000
priority date (Note) -
Abandoned
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Abstract
The invention relates to a method for producing chlorosilanes using silicon containing homogeneously distributed copper silicide. The invention especially relates to a method for producing trichlorosilane by reacting said silicon with water, silicon tetrachloride and optionally hydrogen chloride.
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