Method and apparatus for creating radial profiles on a substrate
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United States of America Patent
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Issued Date -
Feb 10, 2005
app pub date -
Aug 31, 2004
filing date -
Jan 26, 1999
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The gradient deposition method and apparatus permits a radial thickness or composition gradient on a substrate to be formed. The system comprises one or more deposition sources that can be fired sequentially or simultaneously. The system also comprises one or more dynamic shutters (e.g., shutters that can be moved independently of each other and during the deposition of a material) in combination with equipment that permits the substrate to be rotated during the deposition of the material onto the substrate. The system may also include one or more contact masks that may be placed on the substrate during the deposition in order to mask off particular portions of the substrate during the deposition process.
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