Installation and method for vacuum treatment or powder production
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United States of America Patent
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app pub date -
Jan 16, 2004
filing date -
Jul 13, 1999
priority date (Note) -
Abandoned
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Abstract
Vacuum treatment installation with a vacuum treatment chamber containing a plasma discharge configuration as well as a gas supply configuration. The plasma discharge configuration has at least two plasma beam discharge configurations with substantially parallel discharge axes and a deposition configuration is positioned along a surface which extends at predetermined distances from the beam axes and along a substantial section of the longitudinal extent of the discharge beam.
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