Coating for forming a high definition aperture
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United States of America Patent
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Issued Date -
Dec 9, 2004
app pub date -
May 24, 2002
filing date -
May 24, 2002
priority date (Note) -
Abandoned
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Abstract
An optical thin film stack for a dark aperture is deposited using thermal ion-assisted deposition ('IAD'). The IAD provides an energetic deposition of chromium and chromium oxide that results in a dark mirror optical thin film stack with superior etch properties. Edge definition is improved, and the edge profile is controllable by the selection of IAD parameters. An in situ IAD cleaning process can be used to clean the substrate sufficiently so that an intermediate adhesion layer of chromium is not required.
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