Method for removing impurities from silicone-containing residues
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United States of America Patent
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Issued Date -
Nov 4, 2004
app pub date -
Mar 30, 2004
filing date -
Aug 27, 2001
priority date (Note) -
Abandoned
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Abstract
The present invention relates to a method for removing impurities from elemental silicon-containing residues from the processes of producing organochlorosilane and chlorosilane. The residues are subjected to magnetic seperation to provide a relative pure non-magnetic fraction having an increased silicon content and a relatively impure magnetic fraction having a lower silicon content than the non-magnetic fraction.
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