System and method of measuring a distance between two points of a layout
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United States of America Patent
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Issued Date -
Oct 14, 2004
app pub date -
Sep 21, 2001
filing date -
Sep 21, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method of measuring a distance between two points of a layout, which first generates a first view and a second view of the layout, and maintains a transformation relationship between the first view and the second view. Then, after accepting a first point on the first view, trace a cursor's position on the second view as the second point, and graphically displays the distance between the first point and the second point on the first view and the second view. The first point is transformed according to the transformation relationship to determine its position in the second view, and the second point is transformed according to the transformation relationship to determine its position in the first view.
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