Method of providing a layer including a metal or silicon or germanium and oxygen on a surface
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United States of America Patent
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Issued Date -
Oct 7, 2004
app pub date -
Apr 19, 2004
filing date -
May 14, 2001
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Abandoned
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Abstract
A method of providing a layer including a metal or silicon or germanium and oxygen on a surface, the method including the steps of forming an adsorbed layer less than 12 monolayers thick on the surface by exposing it to a liquid or vapor containing metal-, silicon-, or germanium-containing organic molecules, and treating this layer by exposure to a glow discharge in an oxygen containing gas, thereby converting the adsorbed layer to a layer including silicon (or germanium) and oxygen.
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