Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20040164089A1
SERIAL NO

10786698

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Abstract

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PURPOSE: To improve the evaporation efficiency of a raw material by mounting an element of a porous sintered metal having the pore size smaller than the size of the solid raw material to a port for introducing a carrier gas into a bubbler vessel. CONSTITUTION: The solid raw material 2 is housed in the bubbler vessel 1 and is heated by a mantle heater, etc. The carrier gas is introduced from the introducing port 9 into the vessel 1 to generate the saturation pressure of the raw material 2. This material is sent into a film forming chamber 10 of the CVD device from a leading out pipe 8. The element 11 of the porous sintered metal is mounted to this introducing port 9. The carrier gas is ejected to a wide range from the many fine pores of the element 11 to the circumferences thereof and is uniformly dispersed. The wider contact area of the raw material 2 with the carrier gas is taken and the sufficient saturated steam pressure is obtd. The back flow of the raw material 2 to the mass flow controller is obviated even if the pressure on the film forming chamber 10 side increases. The damaging of the controller 4 is thus prevented.

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Patent Owner(s)

Patent OwnerAddress
IQE PLCCARDIFF 3CF 0LW

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Blunt, Roy Trevor Owmbran, GB 2 23
Nelson, Andrew Cowridge, GB 100 1892
Odedra, Rajesh Altrincham, GB 25 1788
Ravetz, Megan Newton, GB 3 35
Williams, Graham Heswall, GB 32 1079
Williams, Howard St. Mellons, GB 9 162

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