Process for thermal plasma spraying of doped semiconductor oxide-based coatings
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United States of America Patent
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Issued Date -
Jul 29, 2004
app pub date -
Dec 10, 2003
filing date -
Dec 13, 2002
priority date (Note) -
Abandoned
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Abstract
A process for the preparation of a composite multilayer product with selective optical properties comprises the operation of depositing, by thermal plasma spraying of powders, a coating of semiconductor oxides doped with oxides of elements chosen from the group consisting of transition metals and metals in the groups III-A and V-A of the periodic table of elements, in which the coating obtained maintains the composition and doping of the thermal plasma sprayed powders substantially unchanged. The figure shows the X-ray diffraction spectrum of a coating deposited according to the process of the present invention.
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