Importance

Loading Importance Indicators...

Abstract

This invention relates to a high-resolution ellipsometry method for quantitative and/or qualitative analysis of sample variations. The sample is located on a sample carrier, equipped with at least one metal film. The parameters .psi. and .DELTA. are determined by ellipsometric measurement, wherein the angle of incidence and/or frequency of the electromagnetic radiation used in ellipsometric measurements is set in such a way as to produce a damped surface plasmon resonance. The detection sensitivity (sample variation unit) is adjusted by means of the thickness of the metal layer. The electromagnetic radiation is planely radiated onto the side of the sample carrier opposite the sample. Using at least one angle of incidence and one frequency at least two staggered, simultaneous, high-resolution ellipsometric measurements are taken of the sample or samples. At least the corresponding .DELTA. or cos .DELTA. value are evaluated to determine sample variation. The invention also relates to a biochip having a base plate with at least one metal layer and a measuring device having an ellipsometer with a radiation source (2), a polarizer (6), an analyzer (7) and a detector (9), which is an image-providing sensor. A lens system (5,8) is arranged in the beam path, behind and in front of the biochip coupling and decoupling device (20), which planely illuminates said coupling and decoupling device and the detecting surface of the detector (9). The invention further relates to an evaluation unit (10) that carries out simultaneous high-resolution processing of the measurement signals and at least for simultaneous high-resolution evaluation of the values .delta. cos .DELTA..

Loading the Abstract Image...

First Claim