Giant magnetoresistance structure
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United States of America Patent
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Apr 10, 2007
Grant Date -
Jun 17, 2004
app pub date -
Jan 25, 2002
filing date -
Jan 30, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention relates to a method for producing a GMR structure in which a metallic multiple layer is applied onto a carrier and in which the metallic multiple layer is patterned to produce the GMR structure, the carrier having a structure before the metallic multiple layer is applied and the patterning of the metallic multiple layer is performed by CMP. The present invention also relates to a GMR structure having a carrier and a patterned metallic multiple layer positioned on the carrier, the patterned metallic multiple layer being situated in one or more depressions of the carrier. In addition, the present invention relates to a use of GMR structures.
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