Method for chlorine plasma modification of silver electrodes
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United States of America Patent
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Issued Date -
Apr 15, 2004
app pub date -
Nov 21, 2003
filing date -
Oct 27, 2000
priority date (Note) -
Abandoned
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Abstract
A method for the modification of a surface of a silver electrode wherein the surface is treated with a chlorine plasma is described. Control of the power, flux density and timing provide the manner to modify the silver surface, and so implant the chlorine atoms and ions into the silver. The present invention provides a method to produce thin-film silver electrodes with a very controlled surface. Such electrodes can provide quantitative quality of measurement. The present invention extends to a method for the modification of a surface of any metal wherein the surface is treated with a plasma.
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