Method for producing trichlorosilane
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United States of America Patent
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Issued Date -
Mar 11, 2004
app pub date -
Oct 15, 2003
filing date -
Dec 14, 2000
priority date (Note) -
Abandoned
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Abstract
The invention relates to a method for producing trichlorosilane by reacting silicon with silicon tetrachloride and hydrogen while adding hydrogen chloride, the residence time of the hydrogen chloride in the reaction chamber being less than the residence time of the silicon tetrachloride.
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