Apparatus and method for processing a substrate

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United States of America Patent

APP PUB NO 20040045575A1
SERIAL NO

10658422

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Abstract

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A lamp house is located face to face with a substrate which is transferred by a conveyer means. A dielectric barrier discharge lamp is provided in the lamp house to irradiate the substrate with ultraviolet light, while a moistened inert gas, consisting of an inert gas and water vapor, is supplied to a space between the substrate and the dielectric barrier discharge lamp from a moistened inert gas generating means. Under irradiation of ultraviolet light from the dielectric barrier discharge lamp, water vapor in the moistened inert gas is split into a reducing active member [H.] and an oxidative active member [.OH].

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Patent Owner(s)

Patent OwnerAddress
HITACHI ELECTRONICS ENGINEERING CO LTDSHIBUYA-KU TOKYO 150

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gommori, Kazuhiko Naka-gun, JP 6 117
Kinoshita, Kazuto Tukuba-shi, JP 9 111
Wada, Kenya Naka-gun, JP 17 118

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