Capillary discharge plasma apparatus and method for surface treatment using the same
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United States of America Patent
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Issued Date -
Feb 26, 2004
app pub date -
Aug 13, 2003
filing date -
Mar 2, 2001
priority date (Note) -
Abandoned
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Abstract
A plasma treatment apparatus for a workpiece includes a metal electrode, a capillary dielectric having first and second sides and coupled to the metal electrode through the first side, wherein the capillary dielectric has at least one capillary, a shield body surrounding the metal electrode and the first side of the capillary dielectric, wherein the shield body has first and second end portions, and a gas supplier providing gas to the metal electrode.
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