Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
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United States of America Patent
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Jul 3, 2007
Grant Date -
Feb 19, 2004
app pub date -
May 2, 2003
filing date -
May 16, 2002
priority date (Note) -
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Abstract
The invention refers to a procedure for etching of materials at the surface by focussed electron beam induced chemical reactions at said surface. The invention is characterized in that in a vacuum atmosphere the material which is to be etched is irradiated with at least one beam of molecules, at least one beam of photons and at least one beam of electrons, whereby the irradiated material and the molecules of the beam of molecules are excited in a way that a chemical reaction predetermined by said material and said molecules composition takes place and forms a reaction product and said reaction product is removed from the material surface-irradiation and removal step.
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