Particle formation
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Feb 12, 2004
app pub date -
Jul 17, 2003
filing date -
Jul 19, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A polyalkylene glycol (PAG)--preferably a polyethylene glycol--or a derivative or conjugate thereof, in particulate form, having a residual solvent content of 200 ppm or less and a volume mean particle diameter of 25 .mu.m or less. Also methods for forming particulate products containing PAGs or derivatives or conjugates thereof, in particular by carrying out a GAS process--preferably a Nektar.TM. SCF process--on a solution or suspension of a target substance but using as the anti-solvent fluid a compressed fluid which at the point of its contact with the solution or suspension is at a temperature of 25.degree. C. or below.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully