Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Feb 12, 2004
app pub date -
Sep 24, 2002
filing date -
Dec 27, 2000
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The atmosphere surrounding a photomask provided with a pellicle (2), particularly, an organic pellicle is replaced for purging with a mixed gas prepared by mixing an inert gas and a small amount of an active gas. The atmosphere in a space (8) between a mask base (1) and a pellicle (2) in a photomask is replaced for purging with a mixed gas prepared by mixing an inert gas and a small amount of an active gas.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully